Show simple item record

dc.contributor.authorKumpulainen, Tero
dc.contributor.authorSingh, Amandeep
dc.contributor.authorMärz, Thomas
dc.contributor.authorDong, Litong
dc.contributor.authorLi, Dayou
dc.contributor.authorReuna, Jarno
dc.contributor.authorVihinen, Jorma
dc.contributor.authorLevänen, Erkki
dc.date.accessioned2021-06-17T08:03:29Z
dc.date.available2021-05-29T00:00:00Z
dc.date.available2021-06-17T08:03:29Z
dc.date.issued2021-05-29
dc.identifier.citationKumpulainen T, Singh A, März T, Dong L, Reuna J, Vihinen J, Li D, Levänen E (2021) 'Interference system for high pressure environment', Optics and Laser Technology, 142 (107278)en_US
dc.identifier.issn0030-3992
dc.identifier.doi10.1016/j.optlastec.2021.107278
dc.identifier.urihttp://hdl.handle.net/10547/625016
dc.description.abstractLaser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.en_US
dc.language.isoenen_US
dc.publisherElsevier Ltden_US
dc.relation.urlhttps://www.sciencedirect.com/science/article/pii/S0030399221003662en_US
dc.rightsGreen - can archive pre-print and post-print or publisher's version/PDF
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjecthigh pressure CO2en_US
dc.subjectsupercritical fluiden_US
dc.subjectlaser material processingen_US
dc.subjectlaser Interference patterningen_US
dc.subjectSubject Categories::F360 Optical Physicsen_US
dc.titleInterference system for high pressure environmenten_US
dc.typeArticleen_US
dc.contributor.departmentTampere Universityen_US
dc.contributor.departmentInnoLas Laser GmbHen_US
dc.contributor.departmentUniversity of Bedfordshireen_US
dc.identifier.journalOptics and Laser Technologyen_US
dc.date.updated2021-06-17T07:57:18Z
dc.description.notegold open access


Files in this item

Thumbnail
Name:
Publisher version
Thumbnail
Name:
1-s2.0-S0030399221003662-main.pdf
Size:
18.64Mb
Format:
PDF

This item appears in the following Collection(s)

Show simple item record

Green - can archive pre-print and post-print or publisher's version/PDF
Except where otherwise noted, this item's license is described as Green - can archive pre-print and post-print or publisher's version/PDF