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dc.contributor.authorGuo, Xudong
dc.contributor.authorLi, Songhao
dc.contributor.authorLei, Zecheng
dc.contributor.authorLiu, Ri
dc.contributor.authorLi, Li
dc.contributor.authorWang, Lu
dc.contributor.authorDong, Litong
dc.contributor.authorPeng, Kuiqing
dc.contributor.authorWang, Zuobin
dc.date.accessioned2020-08-13T12:11:21Z
dc.date.available2020-08-13T12:11:21Z
dc.date.issued2020-03-17
dc.identifier.citationGuo X, Li S, Lei Z, Liu R, Li L, Wang L, Dong L, Peng K, Wang Z (2020) 'Controllable patterning of hybrid silicon nanowire and nanohole arrays by laser interference lithography', physica status solidi (RRL) - Rapid Research Letters, 14 (6), pp.2000024-.en_US
dc.identifier.issn1862-6254
dc.identifier.doi10.1002/pssr.202000024
dc.identifier.urihttp://hdl.handle.net/10547/624390
dc.description.abstractMetal-assisted chemical etching (MACE) is a cost-effective method to fabricate Si nanostructures including silicon nanowires (SiNWs) and silicon nanoholes (SiNHs). However, the preparation of metallic template for MACE would require complex experimental conditions including strict cleaning process and multiple steps. Herein, superlens-enhanced laser interference lithography is applied to directly fabricate complicated metallic patterns and then MACE is used to obtain hybrid SiNW and SiNH arrays. Ag films are first deposited on Si substrates, and then a 1064 nm high power laser source is utilized to generate two-beam interference electric fields. Because Ag molecules are very sensitive to any input energy change, they tend to break up or aggregate and form different Ag patterns which have a specific energy threshold to lower its free energy. By manipulating the distribution of input electric field, complicated metallic patterns and their corresponding Si nanostructures with feature sizes that range from tens of nanometers to several micrometers are obtained.en_US
dc.language.isoenen_US
dc.publisherWiley-VCH Verlagen_US
dc.relation.urlhttps://onlinelibrary.wiley.com/doi/abs/10.1002/pssr.202000024en_US
dc.rightsYellow - can archive pre-print (ie pre-refereeing)
dc.subjectsilicon nanoholes, metal-assisted chemical etching, nanofabrication, silicon nanostructures, silicon nanowiresen_US
dc.subjectsilicon nanoholesen_US
dc.subjectmetal-assisted chemical etchingen_US
dc.subjectnanofabricationen_US
dc.subjectsilicon nanostructuresen_US
dc.subjectsilicon nanowiresen_US
dc.titleControllable patterning of hybrid silicon nanowire and nanohole arrays by laser interference lithographyen_US
dc.typeArticleen_US
dc.identifier.journalphysica status solidi (RRL) - Rapid Research Lettersen_US
dc.date.updated2020-08-13T12:01:39Z
dc.description.noteover 3m from publication


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