Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography
SubjectsLaser interference lithography
MetadataShow full item record
AbstractThis paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications. © 2014 AIP Publishing LLC.
CitationXu J, Wang Z, Zhang Z, Wang D, Weng Z (2014) 'Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography', Journal of Applied Physics, 115 (20), pp.203101-.
PublisherAmerican Institute of Physics Inc.
JournalJournal of Applied Physics