Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography

Zhang, Ziang; Dong, Litong; Ding, Yunfeng; Li, Li; Weng, Zhankun; Wang, Zuobin

dc.contributor.author	Zhang, Ziang	en
dc.contributor.author	Dong, Litong	en
dc.contributor.author	Ding, Yunfeng	en
dc.contributor.author	Li, Li	en
dc.contributor.author	Weng, Zhankun	en
dc.contributor.author	Wang, Zuobin	en
dc.date.accessioned	2019-11-05T11:15:02Z
dc.date.available	2019-11-05T11:15:02Z
dc.date.issued	2017-11-08
dc.identifier.citation	Zhang Z, Dong L, Ding Y, Li L, Weng Z, Wang Z. (2017) 'Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography', Optics Express, 25 (23), pp.29135-29142.	en
dc.identifier.issn	1094-4087
dc.identifier.doi	10.1364/OE.25.029135
dc.identifier.uri	http://hdl.handle.net/10547/623567
dc.description	© 2017 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved	en
dc.description.abstract	In this work, an effective method was presented to obtain a specific micro and nano dual-structures by amplitude modulation in multi-beam laser interference lithography (LIL). Moiré effect was applied to generate the amplitude modulation. The specific intensity modulation patterns can be obtained by the control of the parameter settings of incident laser beams. Both the incident angle and azimuth angle asymmetric configurations can cause the amplitude modulation in the interference optic field and the modulation period is determined by the angle offset. A four-beam LIL system was set up to fabricate patterns on photoresist and verify the method. The experimental results are in good agreement with the theoretical analysis.
dc.description.sponsorship	the “111” project of China, EU FP7 (BioRA No.612641), China- EU H2020 (FabSurfWAR Nos.2016YFE0112100 and 644971), National Natural Science Foundation Program of China (Nos.61176002, 11103047, 11673082 and 11504030), and Jilin Provincial Science and Technology Program (Nos.20140414009GH, 20140622009JC, JJKHZ-2015-67, 20160520101JH, 20160101318JC and 20160623002TC)	en
dc.language.iso	en	en
dc.publisher	Optical Society of America	en
dc.relation.url	https://www.osapublishing.org/oe/abstract.cfm?uri=oe-25-23-29135	en
dc.rights	Green - can archive pre-print and post-print or publisher's version/PDF
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/4.0/	*
dc.subject	laser interference lithography	en
dc.subject	F360 Optical Physics	en
dc.title	Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography	en
dc.type	Article	en
dc.contributor.department	Changchun University of Science and Technology	en
dc.contributor.department	Changchun Observatory	en
dc.identifier.journal	Optics Express	en
dc.date.updated	2019-11-05T10:49:01Z
dc.description.note	OA under OSA licence https://www.osapublishing.org/submit/review/pdf/OSACopyTransferOAAgrmnt(2017-09-05).pdf "Author(s) shall have the right to post the Author Accepted version or Final Publisher Version of Record on their personal non-commercial website or the servers of their institutions or employers. Any such posting made after publication of the Work shall include a link to the online abstract in the Journal and the copyright notice below. The Author(s) agree that all copies of the Work made under any of the above rights shall prominently include the following copyright notice: © XXXX [year] Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved”
html.description.abstract	In this work, an effective method was presented to obtain a specific micro and nano dual-structures by amplitude modulation in multi-beam laser interference lithography (LIL). Moiré effect was applied to generate the amplitude modulation. The specific intensity modulation patterns can be obtained by the control of the parameter settings of incident laser beams. Both the incident angle and azimuth angle asymmetric configurations can cause the amplitude modulation in the interference optic field and the modulation period is determined by the angle offset. A four-beam LIL system was set up to fabricate patterns on photoresist and verify the method. The experimental results are in good agreement with the theoretical analysis.