Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography
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AbstractIn this work, an effective method was presented to obtain a specific micro and nano dual-structures by amplitude modulation in multi-beam laser interference lithography (LIL). Moiré effect was applied to generate the amplitude modulation. The specific intensity modulation patterns can be obtained by the control of the parameter settings of incident laser beams. Both the incident angle and azimuth angle asymmetric configurations can cause the amplitude modulation in the interference optic field and the modulation period is determined by the angle offset. A four-beam LIL system was set up to fabricate patterns on photoresist and verify the method. The experimental results are in good agreement with the theoretical analysis.
CitationZhang Z, Dong L, Ding Y, Li L, Weng Z, Wang Z. (2017) 'Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography', Optics Express, 25 (23), pp.29135-29142.
PublisherOptical Society of America
Description© 2017 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved
Sponsorsthe “111” project of China, EU FP7 (BioRA No.612641), China- EU H2020 (FabSurfWAR Nos.2016YFE0112100 and 644971), National Natural Science Foundation Program of China (Nos.61176002, 11103047, 11673082 and 11504030), and Jilin Provincial Science and Technology Program (Nos.20140414009GH, 20140622009JC, JJKHZ-2015-67, 20160520101JH, 20160101318JC and 20160623002TC)
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