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AbstractA one-step lithography method based on a superlens is proposed to fabricate diffraction-unlimited metallic patterns. By controlling the material parameters and the distribution of the impinging energy, various phenomena, such as periodic nanonetworks, ultrathin nanowires (sub-50-nm feature size), and variable-sized nanoparticles (ranging from sub-10nm to several hundreds of nanometers), are fabricated using a 1,064-nm nanosecond laser. The evolution pathway of such phenomena is explained by the dewetting process of metallic films. The direct-writing performance of a transparent material with a superlens is studied, and the maximum etching depth of Si gratings can reach 2 μm under a single laser pulse, with fine profiles. © 2018 The Japan Society of Applied Physics
CitationGuo X, Li L, Hu Y, Cao L, Dong L, Wang L, Ding R, Weng Z, Song Z, Xu H, Yang Z, Liu X, Tian Y, Wang Z (2018) 'Superlens-enhanced laser interference lithography', Applied Physics Express, 11 (12), pp.125201-.
JournalApplied Physics Express
SponsorsNational Natural Science Foundation Program of China (Nos. 11504030 and 61604018), the National Key R&D Program of China (No. 2016YFE0112100), the EU H2020 Program (FabSurfWAR No. 644971; NanoStencil No. 767285), the Jilin Provincial Science and Technology Program (Nos. 20180520203JH, 20160623002TC, 20180414002GH, 20180414081GH, and 20160101318JC), and the “111” Project of China (D17017).