Error factors affecting the result of Laser Interference Lithography
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AbstractLaser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
CitationZhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., QiuR., Sun, J., Yang, L., Wang, S., (2013) 'Error factors affecting the result of Laser Interference Lithography' Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), International Conference on. Suzhou, China, 26-30 August.
TypeConference papers, meetings and proceedings
SponsorsThis work was supported by National Key Basic Research Program of China (973 Program No.2012CB326406), EU FP7 (LaserNaMi No.247644), EU FP6 (DELILA No.027976), International Science and Technology Cooperation Program of China (No.2012DFA11070), National Natural Science Foundation Program of China (No.60940035 and No.61176002), Doctoral Program of Higher Education of China (No.20112216110002), Jilin Provincial Science and Technology Program (No.201115157, No.20090401 and No.20100703), Guangdong Provincial Department of Science and Technology Program (No.2009B091300006 and No.2011B010700101), and Science and Technology Program of Changchun City (No.09GH07 and No.10GH15), Shaanxi Province Key Lab foundation program, and Xi’an Technological University (No.204-000175 and No.204-000176).