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    Error factors affecting the result of Laser Interference Lithography

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    Authors
    Zhang, Jin
    Jiang, Shilei
    Tan, Chunlei
    Wang, Zuobin
    Li, Dayou
    Yue, Yong
    Qiu, Renxi
    Sun, Guobin
    Yang, Lihong
    Wang, Sanlong
    Affiliation
    Xi'an Technology University
    University of Bedfordshire
    Issue Date
    2013-08
    Subjects
    constrast
    error factors
    interference lithography
    
    Metadata
    Show full item record
    Abstract
    Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
    Citation
    Zhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., QiuR., Sun, J., Yang, L., Wang, S., (2013) 'Error factors affecting the result of Laser Interference Lithography' Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), International Conference on. Suzhou, China, 26-30 August.
    Publisher
    IEEE
    URI
    http://hdl.handle.net/10547/336061
    DOI
    10.1109/3M-NANO.2013.6737387
    Additional Links
    http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6737387
    Type
    Conference papers, meetings and proceedings
    Language
    en
    ISBN
    9781479912100
    Sponsors
    This work was supported by National Key Basic Research Program of China (973 Program No.2012CB326406), EU FP7 (LaserNaMi No.247644), EU FP6 (DELILA No.027976), International Science and Technology Cooperation Program of China (No.2012DFA11070), National Natural Science Foundation Program of China (No.60940035 and No.61176002), Doctoral Program of Higher Education of China (No.20112216110002), Jilin Provincial Science and Technology Program (No.201115157, No.20090401 and No.20100703), Guangdong Provincial Department of Science and Technology Program (No.2009B091300006 and No.2011B010700101), and Science and Technology Program of Changchun City (No.09GH07 and No.10GH15), Shaanxi Province Key Lab foundation program, and Xi’an Technological University (No.204-000175 and No.204-000176).
    ae974a485f413a2113503eed53cd6c53
    10.1109/3M-NANO.2013.6737387
    Scopus Count
    Collections
    Centre for Research in Distributed Technologies (CREDIT)

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