Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography
Abstract
A method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.Citation
Li W, Wang Z., Wang D, Zhang Z., Zhao L., Li D., and Qiu R. (2014) 'Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography', Optical Engineering 53(3): 034109Journal
Optical EngineeringAdditional Links
http://opticalengineering.spiedigitallibrary.org/article.aspx?doi=10.1117/1.OE.53.3.034109Type
ArticleLanguage
enISSN
0091-3286ae974a485f413a2113503eed53cd6c53
10.1117/1.OE.53.3.034109