• Error factors affecting the result of Laser Interference Lithography

      Zhang, Jin; Jiang, Shilei; Tan, Chunlei; Wang, Zuobin; Li, Dayou; Yue, Yong; Qiu, Renxi; Sun, Guobin; Yang, Lihong; Wang, Sanlong; et al. (IEEE, 2013-08)
      Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.