Determination of beam incidence conditions based on the analysis of laser interference patterns

2.50
Hdl Handle:
http://hdl.handle.net/10547/622029
Title:
Determination of beam incidence conditions based on the analysis of laser interference patterns
Authors:
Wang, Dapeng; Wang, Zuobin; Yue, Yong; Yu, Juncai; Tan, Chunlei; Li, Dayou; Qiu, Renxi; Maple, Carsten
Abstract:
Beam incidence conditions in the formation of two-, three- and four-beam laser interference patterns are presented and studied in this paper. In a laser interference lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of laser interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of interference patterns. In this work, interference patterns were captured by a He-Ne laser interference system under different incidence conditions, the pattern period measurement was achieved by cross-correlation with, and the pattern contrast was calculated by image processing. Subsequently, the incident angles and intensities of beams were determined based on the analysis of spatial distributions of interfering beams. As a consequence, the relationship between the beam incidence conditions and interference patterns is revealed. The proposed method is useful for the calibration of LIL processes and for reverse engineering applications.
Affiliation:
Changchun University of Science and Technology; University of Bedfordshire; Jiaotong-Liverpool University; Tampere University of Technology
Citation:
Wang D., Wang Z., Yue Y., Yu J., Tan C., Li D., Qiu R., Maple C. (2015) 'Determination of beam incidence conditions based on the analysis of laser interference patterns', Optik, 126 (21), pp.2902-2907.
Publisher:
Elsevier GmbH
Journal:
Optik
Issue Date:
1-Nov-2015
URI:
http://hdl.handle.net/10547/622029
DOI:
10.1016/j.ijleo.2015.07.039
Additional Links:
http://www.sciencedirect.com/science/article/pii/S0030402615005914
Type:
Article
Language:
en
ISSN:
0030-4026
Appears in Collections:
Engineering

Full metadata record

DC FieldValue Language
dc.contributor.authorWang, Dapengen
dc.contributor.authorWang, Zuobinen
dc.contributor.authorYue, Yongen
dc.contributor.authorYu, Juncaien
dc.contributor.authorTan, Chunleien
dc.contributor.authorLi, Dayouen
dc.contributor.authorQiu, Renxien
dc.contributor.authorMaple, Carstenen
dc.date.accessioned2017-02-27T11:48:20Z-
dc.date.available2017-02-27T11:48:20Z-
dc.date.issued2015-11-01-
dc.identifier.citationWang D., Wang Z., Yue Y., Yu J., Tan C., Li D., Qiu R., Maple C. (2015) 'Determination of beam incidence conditions based on the analysis of laser interference patterns', Optik, 126 (21), pp.2902-2907.en
dc.identifier.issn0030-4026-
dc.identifier.doi10.1016/j.ijleo.2015.07.039-
dc.identifier.urihttp://hdl.handle.net/10547/622029-
dc.description.abstractBeam incidence conditions in the formation of two-, three- and four-beam laser interference patterns are presented and studied in this paper. In a laser interference lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of laser interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of interference patterns. In this work, interference patterns were captured by a He-Ne laser interference system under different incidence conditions, the pattern period measurement was achieved by cross-correlation with, and the pattern contrast was calculated by image processing. Subsequently, the incident angles and intensities of beams were determined based on the analysis of spatial distributions of interfering beams. As a consequence, the relationship between the beam incidence conditions and interference patterns is revealed. The proposed method is useful for the calibration of LIL processes and for reverse engineering applications.en
dc.language.isoenen
dc.publisherElsevier GmbHen
dc.relation.urlhttp://www.sciencedirect.com/science/article/pii/S0030402615005914en
dc.rightsGreen - can archive pre-print and post-print or publisher's version/PDF-
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjectbeam incidence conditionen
dc.subjectlaser interferenceen
dc.subjectinterference lithographyen
dc.subjectmodulation perioden
dc.titleDetermination of beam incidence conditions based on the analysis of laser interference patternsen
dc.typeArticleen
dc.contributor.departmentChangchun University of Science and Technologyen
dc.contributor.departmentUniversity of Bedfordshireen
dc.contributor.departmentJiaotong-Liverpool Universityen
dc.contributor.departmentTampere University of Technologyen
dc.identifier.journalOptiken
dc.date.updated2017-02-27T11:28:16Z-
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