2.50
Hdl Handle:
http://hdl.handle.net/10547/336061
Title:
Error factors affecting the result of Laser Interference Lithography
Authors:
Zhang, Jin; Jiang, Shilei; Tan, Chunlei; Wang, Zuobin; Li, Dayou; Yue, Yong; Qiu, Renxi; Sun, Guobin; Yang, Lihong; Wang, Sanlong
Abstract:
Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
Affiliation:
Xi'an Technology University; University of Bedfordshire
Citation:
Zhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., QiuR., Sun, J., Yang, L., Wang, S., (2013) 'Error factors affecting the result of Laser Interference Lithography' Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), International Conference on. Suzhou, China, 26-30 August.
Publisher:
IEEE
Issue Date:
Aug-2013
URI:
http://hdl.handle.net/10547/336061
DOI:
10.1109/3M-NANO.2013.6737387
Additional Links:
http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6737387
Type:
Conference papers, meetings and proceedings
Language:
en
ISBN:
9781479912100
Sponsors:
This work was supported by National Key Basic Research Program of China (973 Program No.2012CB326406), EU FP7 (LaserNaMi No.247644), EU FP6 (DELILA No.027976), International Science and Technology Cooperation Program of China (No.2012DFA11070), National Natural Science Foundation Program of China (No.60940035 and No.61176002), Doctoral Program of Higher Education of China (No.20112216110002), Jilin Provincial Science and Technology Program (No.201115157, No.20090401 and No.20100703), Guangdong Provincial Department of Science and Technology Program (No.2009B091300006 and No.2011B010700101), and Science and Technology Program of Changchun City (No.09GH07 and No.10GH15), Shaanxi Province Key Lab foundation program, and Xi’an Technological University (No.204-000175 and No.204-000176).
Appears in Collections:
Centre for Research in Distributed Technologies (CREDIT)

Full metadata record

DC FieldValue Language
dc.contributor.authorZhang, Jinen
dc.contributor.authorJiang, Shileien
dc.contributor.authorTan, Chunleien
dc.contributor.authorWang, Zuobinen
dc.contributor.authorLi, Dayouen
dc.contributor.authorYue, Yongen
dc.contributor.authorQiu, Renxien
dc.contributor.authorSun, Guobinen
dc.contributor.authorYang, Lihongen
dc.contributor.authorWang, Sanlongen
dc.date.accessioned2014-11-25T13:00:11Z-
dc.date.available2014-11-25T13:00:11Z-
dc.date.issued2013-08-
dc.identifier.citationZhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., QiuR., Sun, J., Yang, L., Wang, S., (2013) 'Error factors affecting the result of Laser Interference Lithography' Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), International Conference on. Suzhou, China, 26-30 August.en
dc.identifier.isbn9781479912100-
dc.identifier.doi10.1109/3M-NANO.2013.6737387-
dc.identifier.urihttp://hdl.handle.net/10547/336061-
dc.description.abstractLaser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.en
dc.description.sponsorshipThis work was supported by National Key Basic Research Program of China (973 Program No.2012CB326406), EU FP7 (LaserNaMi No.247644), EU FP6 (DELILA No.027976), International Science and Technology Cooperation Program of China (No.2012DFA11070), National Natural Science Foundation Program of China (No.60940035 and No.61176002), Doctoral Program of Higher Education of China (No.20112216110002), Jilin Provincial Science and Technology Program (No.201115157, No.20090401 and No.20100703), Guangdong Provincial Department of Science and Technology Program (No.2009B091300006 and No.2011B010700101), and Science and Technology Program of Changchun City (No.09GH07 and No.10GH15), Shaanxi Province Key Lab foundation program, and Xi’an Technological University (No.204-000175 and No.204-000176).en
dc.language.isoenen
dc.publisherIEEEen
dc.relation.urlhttp://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6737387en
dc.subjectconstrasten
dc.subjecterror factorsen
dc.subjectinterference lithographyen
dc.titleError factors affecting the result of Laser Interference Lithographyen
dc.typeConference papers, meetings and proceedingsen
dc.contributor.departmentXi'an Technology Universityen
dc.contributor.departmentUniversity of Bedfordshireen
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