Error factors affecting the result of Laser Interference Lithography
Authors
Zhang, JinJiang, Shilei
Tan, Chunlei
Wang, Zuobin
Li, Dayou
Yue, Yong
Qiu, Renxi
Sun, Guobin
Yang, Lihong
Wang, Sanlong
Issue Date
2013-08
Metadata
Show full item recordAbstract
Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.Citation
Zhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., QiuR., Sun, J., Yang, L., Wang, S., (2013) 'Error factors affecting the result of Laser Interference Lithography' Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), International Conference on. Suzhou, China, 26-30 August.Publisher
IEEEType
Conference papers, meetings and proceedingsLanguage
enISBN
9781479912100Sponsors
This work was supported by National Key Basic Research Program of China (973 Program No.2012CB326406), EU FP7 (LaserNaMi No.247644), EU FP6 (DELILA No.027976), International Science and Technology Cooperation Program of China (No.2012DFA11070), National Natural Science Foundation Program of China (No.60940035 and No.61176002), Doctoral Program of Higher Education of China (No.20112216110002), Jilin Provincial Science and Technology Program (No.201115157, No.20090401 and No.20100703), Guangdong Provincial Department of Science and Technology Program (No.2009B091300006 and No.2011B010700101), and Science and Technology Program of Changchun City (No.09GH07 and No.10GH15), Shaanxi Province Key Lab foundation program, and Xi’an Technological University (No.204-000175 and No.204-000176).ae974a485f413a2113503eed53cd6c53
10.1109/3M-NANO.2013.6737387