Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography

2.50
Hdl Handle:
http://hdl.handle.net/10547/336059
Title:
Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography
Authors:
Li, Wenjun; Wang, Zuobin; Wang, Dapeng; Zhang, Ziang; Zhao, Le; Li, Dayou; Qiu, Renxi; Maple, Carsten
Abstract:
A method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.
Affiliation:
University of Bedfordshire; Changchun University of Science and Technology
Citation:
Li W, Wang Z., Wang D, Zhang Z., Zhao L., Li D., and Qiu R. (2014) 'Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography', Optical Engineering 53(3): 034109
Publisher:
Society of Photo-optical Instrumentation Engineers (SPIE)
Journal:
Optical Engineering
Issue Date:
2014
URI:
http://hdl.handle.net/10547/336059
DOI:
10.1117/1.OE.53.3.034109
Additional Links:
http://opticalengineering.spiedigitallibrary.org/article.aspx?doi=10.1117/1.OE.53.3.034109
Type:
Article
Language:
en
ISSN:
0091-3286
Appears in Collections:
Centre for Research in Distributed Technologies (CREDIT)

Full metadata record

DC FieldValue Language
dc.contributor.authorLi, Wenjunen
dc.contributor.authorWang, Zuobinen
dc.contributor.authorWang, Dapengen
dc.contributor.authorZhang, Ziangen
dc.contributor.authorZhao, Leen
dc.contributor.authorLi, Dayouen
dc.contributor.authorQiu, Renxien
dc.contributor.authorMaple, Carstenen
dc.date.accessioned2014-11-25T12:43:46Z-
dc.date.available2014-11-25T12:43:46Z-
dc.date.issued2014-
dc.identifier.citationLi W, Wang Z., Wang D, Zhang Z., Zhao L., Li D., and Qiu R. (2014) 'Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography', Optical Engineering 53(3): 034109en
dc.identifier.issn0091-3286-
dc.identifier.doi10.1117/1.OE.53.3.034109-
dc.identifier.urihttp://hdl.handle.net/10547/336059-
dc.description.abstractA method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.en
dc.language.isoenen
dc.publisherSociety of Photo-optical Instrumentation Engineers (SPIE)en
dc.relation.urlhttp://opticalengineering.spiedigitallibrary.org/article.aspx?doi=10.1117/1.OE.53.3.034109en
dc.rightsArchived with thanks to Optical Engineeringen
dc.subjectlaser interference lithographyen
dc.subjectfabrication of nanostructuresen
dc.subjectnanostructuresen
dc.titleSuperhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithographyen
dc.typeArticleen
dc.contributor.departmentUniversity of Bedfordshireen
dc.contributor.departmentChangchun University of Science and Technologyen
dc.identifier.journalOptical Engineeringen
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